Thin-film structures

Thin-film structures for nanoelectronic applications and functional coatings

Group leader: Väino Sammelselg, Institute of Physics, University of Tartu

The aim of ourinvestigations is to improve existing techniques and develop new methods for preparation of high-quality thin-film structures that contain ultrathin solid films and/or nano-clusters and could be applied in

• capacitor structures of next-generation dynamic random access memories,
• resistivity-switching memory structures (memristors),
• flash memories,
• gate stacks of field effect transistors with novel high-mobility channel materials,
• spintronic devices and
• functional surface coatings such as diffusion barriers, surface-passivating, anticorrosion and biocompatible coatings.

Different material technologies, incl. those suitable for preparation of graphene and nanoparticles, will be combined in the research whereas atomic layer deposition that allows atomic-layer level control of material synthesis will be used as the main technique to deposit ultrathin layers of solid-state structures for various applications.