{"id":17,"date":"2024-04-04T01:33:46","date_gmt":"2024-04-03T22:33:46","guid":{"rendered":"https:\/\/sisu.ut.ee\/namurplus\/ald\/"},"modified":"2026-01-11T00:31:06","modified_gmt":"2026-01-10T22:31:06","slug":"ald_services","status":"publish","type":"page","link":"https:\/\/sisu.ut.ee\/namurplus\/ald_services\/?lang=en","title":{"rendered":"Atomic Layer Deposition"},"content":{"rendered":"<p>\u00a0<\/p>\n\n\n\n<p>The Laboratory of Thin Film Chemical Technologies in the Department of Materials and Environmental Technology at Tallinn University of Technology provides the service of using an atomic layer deposition (ALD) technique for coating planar and 3D objects with thin, compact and nanometer scale coatings with controlled thickness.<br>The ALD device Picosun has the capability to deposit different metal sulfide and oxysulfide containing coatings for applications in solar cell structures as an absorber material and\/or buffer layers, also as recombination barrier layers and\/or chemical protective coatings for different structural elements.<\/p>\n\n\n\n<figure class=\"wp-block-image aligncenter is-resized\"><img loading=\"lazy\" decoding=\"async\" width=\"2560\" height=\"1861\" src=\"https:\/\/sisu.ut.ee\/wp-content\/uploads\/sites\/293\/ald_taltech_web-scaled.jpg\" alt=\"ald_taltech_web.jpg\" class=\"wp-image-43\" style=\"width:630px;height:auto\" title=\"ald_taltech_web.jpg\" srcset=\"https:\/\/sisu.ut.ee\/wp-content\/uploads\/sites\/293\/ald_taltech_web-scaled.jpg 2560w, https:\/\/sisu.ut.ee\/wp-content\/uploads\/sites\/293\/ald_taltech_web-300x218.jpg 300w, https:\/\/sisu.ut.ee\/wp-content\/uploads\/sites\/293\/ald_taltech_web-1024x745.jpg 1024w, https:\/\/sisu.ut.ee\/wp-content\/uploads\/sites\/293\/ald_taltech_web-768x558.jpg 768w, https:\/\/sisu.ut.ee\/wp-content\/uploads\/sites\/293\/ald_taltech_web-1536x1117.jpg 1536w, https:\/\/sisu.ut.ee\/wp-content\/uploads\/sites\/293\/ald_taltech_web-2048x1489.jpg 2048w, https:\/\/sisu.ut.ee\/wp-content\/uploads\/sites\/293\/ald_taltech_web-1920x1396.jpg 1920w\" sizes=\"auto, (max-width: 2560px) 100vw, 2560px\"><\/figure>\n\n\n\n<p>\u00a0<\/p>\n\n\n\n<p><strong>Services include:<\/strong><\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Consultation \u2013 scientific technical problems and the applicability of these methods for providing the client with solutions to problems of interest will be discussed with the client,<\/li>\n\n\n\n<li>Preparation of samples by qualified specialists,<\/li>\n\n\n\n<li>Development work, during which novel technological approaches will be developed and\/or implemented, which the provided infrastructure can facilitate to solve the specific problems of the client,<\/li>\n\n\n\n<li>Research work, in which laboratory specialists solve complex scientific-technical problems of interest to the client in collaboration with the client.<\/li>\n<\/ul>\n\n\n\n<p>We organize workshops for preparing materials by chemical methods.<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Contact person: <strong>Ilona Oja Acik<\/strong> (e-mail: ilona.oja@taltech.ee) Tallinn University of Technology, Department of Materials and Environmental Technology, Head of Laboratory of Thin Film Chemical Methods.<\/li>\n<\/ul>\n\n\n\n<p>\u00a0<\/p>\n\n\n\n<p><em>Estonian Research Infrastructures Roadmap object \u201eCenter of nanomaterials technologies and research (NAMUR+)\u201d is co-fundeded by European Regional Development Fund (projects \u201eNanomaterials \u2013 research and applications\u201c,\u00a03.2.0304.12-0397, 01.02.2012-31.12.2015\u00a0and \u201eCenter of nanomaterials technologies and research\u201d, 2014-2020.4.01.16-0123, 01.01.2017-30.06.2022).<\/em> <em>The infrastructure is also supported by the Estonian Research Council (projects TARISTU24-TK26, IUT20-54, and TT13).<\/em><\/p>\n","protected":false},"excerpt":{"rendered":"<p>\u00a0 The Laboratory of Thin Film Chemical Technologies in the Department of Materials and Environmental Technology at Tallinn University of Technology provides the service of using an atomic layer deposition (ALD) technique for coating planar and 3D objects with thin, &#8230;<\/p>\n","protected":false},"author":157,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"_acf_changed":false,"inline_featured_image":false,"footnotes":""},"class_list":["post-17","page","type-page","status-publish","hentry"],"acf":[],"_links":{"self":[{"href":"https:\/\/sisu.ut.ee\/namurplus\/wp-json\/wp\/v2\/pages\/17","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/sisu.ut.ee\/namurplus\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/sisu.ut.ee\/namurplus\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/sisu.ut.ee\/namurplus\/wp-json\/wp\/v2\/users\/157"}],"replies":[{"embeddable":true,"href":"https:\/\/sisu.ut.ee\/namurplus\/wp-json\/wp\/v2\/comments?post=17"}],"version-history":[{"count":3,"href":"https:\/\/sisu.ut.ee\/namurplus\/wp-json\/wp\/v2\/pages\/17\/revisions"}],"predecessor-version":[{"id":444,"href":"https:\/\/sisu.ut.ee\/namurplus\/wp-json\/wp\/v2\/pages\/17\/revisions\/444"}],"wp:attachment":[{"href":"https:\/\/sisu.ut.ee\/namurplus\/wp-json\/wp\/v2\/media?parent=17"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}